发明名称 Method of making graded junction containing amorphous semiconductor device
摘要 This invention discloses a new semiconductor device having no step type p-i-n juctions but rather has a graded p-i-n juction. The semiconductor device shows a high photoelectric conversion efficiency, and since said device can be produced easily with good reproducibility by a plasma discharge method, it is especially suited for use as a solar battery. An apparatus for the production of said semiconductor device is also disclosed.
申请公布号 US4742012(A) 申请公布日期 1988.05.03
申请号 US19860948419 申请日期 1986.12.30
申请人 TOA NENRYO KOGYO K.K. 发明人 MATSUMURA, MITSUO;YAMAMOTO, HIDEO;FUKUI, KEITARO;YOSHIDA, TOSHIHIRO;OKAYASU, YOSHINOBU;ASAI, KUNIO;NAKAMURA, OSAMU
分类号 H01L31/065;H01L31/075;H01L31/20;(IPC1-7):H01L31/18 主分类号 H01L31/065
代理机构 代理人
主权项
地址