| 摘要 |
<p>The invention relates to an apparatus for irradiating material by an electron beam. The apparatus comprises guidance means for placing the material on the path of the beam, an electron gun provided in a tight enclosure having a shape with a symmetry or revolution with respect to an axis, an electron-emitting filament located in the axis of the enclosure, as well as a wehnelt electrode surrounding the filament. It is provided with a first circular slot for consentrating electrons in the vicinity of the said slot and an electron accelerating electrode surrounding the wehnelt electrode and having a second circular slot facing the first slot. The enclosure comprises a tightly closed circular window which is transparent to the electrons and which faces the two slots. Application to irradiation by electron beams.</p> |
