| 摘要 |
PURPOSE:To increase the X-ray brightness of a lithography equipment by a method wherein X-ray laser induction-discharged by means of entering the X-rays into plasma in excited state is led to a semiconductor substrate. CONSTITUTION:The charge of capacitors 2 charged by a high voltage power supply 1 actuates trigger electrodes 5 to be discharged between a pair of electrodes 31-41. Thus, discharged plasma is produced between respective electrodes to bring about an excited state of atoms in plasma. A part of X-rays emitted from spot plasma between the electrodes 31 and 41 become incident x-rays into electrodes 32, 33 inducing induction discharge phenomenon to emit x-rays in the same direction as that of the incident rays so that the induction discharge may take place successively to emit X-rays 9. Finally, the X-rays 9 are picked up on an exposure part through a window 10 to transfer the pattern of a mask 12 on a holder 11 to the Si wafer 13 on an aligner 14. In such a constitution, an X-ray output in high brightness can be generated enabling a fine pattern to be transferred. |
