发明名称 SURFACE TREATING DEVICE
摘要 PURPOSE:To form a high-quality surface-treated layer with excellent productivity by fixing a vaporization source, and surface-treating a long-sized material to be treated while rotating and transferring the material at the time of applying treatment such as vapor deposition on the surface of the long-sized material to be treated having a circular cross section. CONSTITUTION:When the surface of the long-sized and cylindrical material 7 to be treated such as a rod or a pipe is plated in a vacuum by vapor deposition, sputtering, ion plating, etc., or treated by thermal spraying, ion implantation, laser beam irradiation, etc., the long-sized material 7 to be treated is passed through the high-vacuum front sealing chambers 1 and 2, washing chamber 3, surface treating chamber 4, and rear sealing chambers 5 and 6 separated by partition walls 9, and the vaporized material from the vaporization source 24 is deposited in the surface treating chamber 4. In this case, the vaporization source 24 is fixed, the material 7 to be treated is transferred and rotated by a rotating and transferring device 22 consisting of a couple of engaging members 31 and 32, and hence a uniform-quality surface-treated layer is formed on the surface of the pipy member 7 to be treated with good productivity.
申请公布号 JPS63100181(A) 申请公布日期 1988.05.02
申请号 JP19860243113 申请日期 1986.10.15
申请人 ISHIKAWAJIMA HARIMA HEAVY IND CO LTD 发明人 NASU TOSHIYUKI
分类号 B05B7/16;C08J7/00;C23C14/50;C23C14/56;C23C26/00 主分类号 B05B7/16
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