发明名称 FE-SI-AL-BASE ALLOY FOR VAPOR DEPOSITION
摘要 PURPOSE:To stably and efficiently obtain a magnetic thin film having high purity and superior characteristics, by incorporating specific amounts of Al, Ca, Mg, O, and N to an Fe-Si-Al-base alloy for vapor deposition. CONSTITUTION:The Fe-Si-Al-base alloy for vapor deposition has a composition consisting of, by weight, 5-15% Si, 3-8% Al, <=300ppm of Ca and Mg, <=30ppm O, <=30ppm N, and the balance essentially Fe and further containing, if necessary, <=3% of one or more elements among Ti, Zr, and Cr. This alloy is minimal in O and N contents and, owing to gettering action by Al and Ti and by Ca and Mg, gas components in a vapor deposition atmosphere can be reduced. Accordingly, the thin film having high purity and excellent in magnetic properties can be obtained. This alloy is useful as vapor deposition material for manufacturing thin film of high magnetic permeability material.
申请公布号 JPS63100156(A) 申请公布日期 1988.05.02
申请号 JP19860243630 申请日期 1986.10.14
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 NAGASHIMA YOSHISATO;DEGAWA TORU
分类号 C22C38/00;C22C38/06;C23C14/14;H01F1/147;H01F10/14 主分类号 C22C38/00
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