| 摘要 |
PURPOSE:To enable uniform development and decrease dimensional difference by running off developer from a nozzle in parallel to an upper face of a rotating wafer and scanning the developer to the whole face while a reflective plate is subjected to parallel displacement and rotation on the upper face of the wafer. CONSTITUTION:A wafer 33 is adsorbed 32 and rotated, and developer 38 from a nozzle 34 is blasted off to a reflective plate 35 in parallel to the wafer. Reflected liquid becomes film-flow and is scanned to whole face of the wafer by rotation of a motor 37 of the reflective plate 35. According to the constitution, as a resist on the wafer 33 is developed uniformly, dimension of the resist pattern is almost constant inside the surface of the wafer. |
