| 摘要 |
PURPOSE:To obtain a silver halide photosensitive material having good quality of negative character, and less trace due to taping by exposing a silver halide photographic sensitive material contg. a tetrazolium compd. and a specific compd., with a light source having the max. value of specific energy at a specific wavelength. CONSTITUTION:The silver halide photographic sensitive material comprises the tetrazolium compd., the silver halide particle contg. at least 50mol% silver chloride, and the compd. having the max. absorption at the longer wavelength than the max. photosensitive wavelength of the silver halide particle by at least 50nm. Said silver halide photographic sensitive material is exposed with the light source having the max. value of the specific energy at the wavelength of 390-430nm. The compd. having the max. absorption at the longer wavelength than the max. photosensitive wavelength of the silver halide particle by at least 50nm wavelength is preferably used in range of 5mg-3g/m<2>. The optical density of said material at the max. absorption wavelength is preferably >=0.10. Thus, the image of the silver halide photographic sensitive material having the good performance with exposure of a selected light source, especially, the good photographic performance such as the good quality of negative character in repeating performance and reduced trace due to taping, can be formed. |
