发明名称 ULTRAVIOLET RAY IRRADIATION DEVICE
摘要 <p>PURPOSE:To improve the efficiency of space by a method wherein wafers are conveyed in the state in which they are arranged in a plurality of columns in an ultraviolet ray irradiation part, and a large quantity of wafers are treated without increasing the length of the title irradiation device. CONSTITUTION:The wafers 2 in a cassette 3 are sent out one by one to a feeding part 4 by a loader 1. When four wafers 2 are arranged in series by the feeding part 4, the four wafers on the feeding part 4 are carried out together to the first column wafer pedestal in an ultraviolet ray irradiation part 5 by the movement of a shuttle 12. At this time, the wafers on the wafer pedestal of the 1-3 column are simultaneously conveyed to the pedestal of the 2-4 columns, and the wafers on the fourth column are conveyed to a recovery part 6. The wafers 2 came out from the irradiation part 5 are fed to an unloader 7 one by one by the recovery part 6. The wafers 2 are housed in the cassette 2 successively by an unloader 7. As a result, special efficiency can be improved, the handling of the cassette 3 can be made easy, and workability can also be improved.</p>
申请公布号 JPS6393112(A) 申请公布日期 1988.04.23
申请号 JP19860237907 申请日期 1986.10.08
申请人 HITACHI LTD 发明人 SAITO SEIKICHI;HANNO TSUTOMU
分类号 H01L21/26;G03F7/20;H01L21/027;H01L21/677 主分类号 H01L21/26
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