发明名称 SHUTTER STRUCTURE OF MOLECULAR BEAM EPITAXIAL APPARATUS
摘要 PURPOSE:To prevent the deposits of a material to be vaporized from being hanged up by the edge of the cell opening when a shutter is opened or closed, by forming the inner surface of the shutter provided on the opening portion of a cell within a crystal growth chamber into the shape of a cap which is recessed. CONSTITUTION:A cell 3 is a vessel shaped in a crucible, which contains therein a material to be vaporized 4 and is provided with a heater 5 for heating the material to be vaporized 4. On the opening portion 3a of the cell 3, a shutter 6 consists of molybdenum, tantalum or the like is disposed to control the molecular beams of the material to be vaporized 4 which is to be applied to a substrate, and the shutter 6 is recessed so as to have an angled cross section. Since the inner surface 6a of the shutter 6 is recessed, even if the material to be vaporized 4 within the cell 3 deposited on the inner surface of the shutter 6, the deposits 4a would be contained within the shutter 6 and would not affect the opening and closing operations of the shutter 6. In addition, deformation of the sutter due to the bimetal effect can be prevented, thereby causing precise epitaxial growth to occur.
申请公布号 JPS62287616(A) 申请公布日期 1987.12.14
申请号 JP19860132222 申请日期 1986.06.06
申请人 ROHM CO LTD 发明人 ISHIDA YUJI;MUSHIGAMI MASAHITO;TANAKA HARUO
分类号 H01L21/203;C30B23/08;H01L21/26 主分类号 H01L21/203
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