| 摘要 |
PURPOSE:To confirm positions of fine flaws, stuck fine grains, etc. on the sample surface to allow the X-ray analysis by radiating the laser light to the sample and forming a dark field image by the scattered light. CONSTITUTION:A helium-neon leser oscillator 16 is provided on an optical microscope performing the X-ray analysis by projecting an electron beam 1 to a sample 5 such as a wafer moved by a moving device 6. When the laser light from the oscillator 16 is radiated, the scattered light is generated by flaws, fine grains, etc. on the surface of the sample 5 to form a dark field image, and a luminescent spot is generated on an image pick-up device 15. The sample is moved via the device 6 so that this luminescent spot is located at the cross mark point of the device 15, and the electron beam is radiated, then positions of fine flaws and stuck fine grains on the sample surface are confirmed, and X-ray analysis can be performed. |
