发明名称 ALUMINUM PLATE FOR LITHOGRAPHY
摘要 PURPOSE:To enhance the adhesion of a photosensitive layer, by a method wherein an aluminum sheet is treated with an aqueous solution containing oxycarboxylic acid, the salts thereof, etc. and having a specific range of pH to form a thin film and, thereafter, a photosensitive resin film layer is formed. CONSTITUTION:An aqueous solution of pH1.5-6.5 containing oxycarboxylic acid and/or one or more sorts of the salts thereof and phosphoric acid and/or one or more sorts of zirconium salts is prepared. An aluminum sheet is treated with this aqueous solution to form a thin film and, thereafter, a photosensitive resin film layer is formed to obtain an aluminum plate for lithography. An aluminum sheet which is previously treated with an anodic oxidation coating is preferably used as the aluminum sheet to be treated to form the thin film.
申请公布号 JPS6391293(A) 申请公布日期 1988.04.21
申请号 JP19860235480 申请日期 1986.10.04
申请人 NIPPON PARKERIZING CO LTD 发明人 KANEKO HIDEAKI;ODA NOBUYUKI
分类号 B41N3/00;B41N3/03 主分类号 B41N3/00
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