发明名称 PRODUCTION OF BASE MATERIAL FOR TRANSPARENT GLASS
摘要 PURPOSE:To easily obtain a base material for transparent glass even if the raw material of a dopant is substance difficult to be gasified by heating the raw material of the dopant arranged in the lower part of the inside of a reactor core pipe and making this inside of the reactor core pipe to the atmospheric state of the gaseous dopant and making the porous base material of glass transparent. CONSTITUTION:The inside of a reactor cope pipe 1 is heated i.e. at 1,400-17,00 deg.C suitable for sintering of a porous base material 2 of glass with a heating oven 3 for sintering. Together therewith, the raw materials 4 of a dopant is heated i.e. at 100-500 deg.C with a heating oven 5 for gasification and made to a gaseous state in the inside of the reactor core pipe 1. At this time, gas such as He and O2 is introduced 6 from the lower part of the pipe 1 and discharged 7 from the upper part thereof. Then a base material 2 is slowly inserted into the pipe 1 from the upper part thereof. In this case, when the base material 2 is passed through the heating zone of the heating oven 3, it is slowly subjected to transparent vitrification (sintering) from the end part of the insertion side, simultaneously the gaseous dopant material is added to the inside of the base material 2 and this is subjected to transparent vitrification, and the aimed base material of transparent glass is obtained.
申请公布号 JPS6389426(A) 申请公布日期 1988.04.20
申请号 JP19860232198 申请日期 1986.09.30
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 TAKAHASHI HIROSHI
分类号 G02B6/00;C03B8/00;C03B8/04;C03B37/014 主分类号 G02B6/00
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