| 摘要 |
PURPOSE:To transfer a wafer to a predetermined position while it is kept clean by mounting a holder sucking and holding the wafer under a noncontact state by means of a fluid blowout section and a fluid suction section on the periphery of the fluid blowout section, and a guide brought into contact with the periphery of the held wafer and positioning the wafer. CONSTITUTION:Three holding surfaces 2A formed to a holder 2 for a shifter each have fluid blowout sections at central sections, and have fluid suction sections on the peripheries. A blowout section consisting of a fluid path 6, a constriction 5 and an opening section 4 is supplied with air from a supply source 9 through a valve 8 and a duct 7, and air is sucked to a suction source 14 through a duct 12 and a valve 13 from a suction section composed of an annular groove 10 and a path 11. Consequently, a wafer 1 can be sucked and held tightly under a noncontact state to the holding surfaces 2A. Since a fluid from the blowout section is all sucked into the suction section, dust is not also rolled up. The fluid is sprayed from a fluid spray section 16, and the wafer 1 is brought into contact with a guide 15 on the right side in the figure, thus positioning the wafer. |
