发明名称 SURFACE ANALYSIS OF SAMPLE
摘要 PURPOSE:To eliminate errors by the ruggedness of a sample by preliminarily forming a coating layer contg. a specific element on the sample, forming the relations between the respective X-ray intensities of the sample and the coating layer with respect to analysis heights and correcting measured X-ray intensities. CONSTITUTION:An electron beam is projected from a filament part 2 to the sample 1 and the reflected beam thereof is detected by two systems of spectroscopes 9, 10 and detectors 11, 12. The coating layer contg. Au is first formed on the sample surface having; for example, an Si distribution. The height of a stage 14 is changed at the arbitrary point of the sample 1 and the characteristic X-ray intensities of Si and Au with respect to the analysis heights are detected. The relations between the respective characteristic X-ray intensities of Si and Au with the analysis heights are determined. The characteristic X-ray intensities of Si and Au are thereafter measured over the entire surface of the sample. The measured characteristic X-ray intensities of Si with respect to the analysis heights are corrected in accordance with the predetermined relations between the analysis heights and the characteristic X-ray intensities of Si and Au to obtain the true data. The errors by the ruggedness of the sample are, therefore, eliminated and the measurement with the high accuracy is permitted.
申请公布号 JPS6383646(A) 申请公布日期 1988.04.14
申请号 JP19860230753 申请日期 1986.09.27
申请人 SHIMADZU CORP 发明人 HIRAI TERUJI
分类号 G01N23/225;H01J37/252 主分类号 G01N23/225
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