Lithography apparatus.

摘要

There is disclosed a lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, comprising a framing pattern memory (4) for storing therein framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator (3) for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for drawing (5) for scanning said framing pattern memory having the framing lines of the pattern to be drawn written therein and for generating a beam deflection address for drawing (207, 208) and a beam blanking control signal (211).