| 摘要 |
PURPOSE:To enhance spectral sensitivity by forming a photosensitive layer made of an amorphous silicon hydride in a specified flow rate ratio of diborane and silane on a conductive substrate. CONSTITUTION:The photosensitive layer 2 made of an amorphous silicon hydride doped with B is formed on a conductive substrate 1 in a diborane (B2H6) to silane (SiH4) flow rate ratio of (1-10):1,000,000. As the substrate 1, a conductive material, such as aluminum, iron, copper, or the like metal, or alloys, or a composite material obtained by using an insulating material, such as polycarbonate, polyvinyl chloride, polyethylene, glass, or paper, and subjecting it to a treatment for imparting conductivity on the side of the photosensitive layer 2, thus permitting the obtained photosensitive body to be enhanced in the spectral sensitivity in the wavelength region >=700nm necessary for using semiconductor laser beams. |
