| 摘要 |
PURPOSE:To prevent a defective wafer due to the transfer of the shadow of a flaw or a foreign matters from being manufactured, by covering the rear plane of a photomask substrate with a protecting film. CONSTITUTION:A light shielding film by a chrome is formed over the entire surface of a prescribed quadrangular fused quartz consisting of a reticle substrate 2, by evaporation or sputtering. Nearly at a time when the light shielding film is formed, a transparent protecting film 5 is formed on a plane on the opposite side of the forming plane of the light shielding film, that is the plane which forms the rear plane side of the reticle. In this way, it is possible to prevent the flaw on the rear plane of a photomask from being generated in the process of manufacturing the photomask, and to remove the foreign matters attached on the rear plane side by peeling the protecting film just before an exposure process, and as result, the defective wafer due to the transfer of the shadow of the flaw or the foreign matters can be prevented from being manufactured. |
