| 摘要 |
PURPOSE:To improve reliability for the inspection of a wafer, by storing data such as the defective position of a photomask, or the size of a pattern, in a memory part consisting of a magnetic thin film, etc., on a photomask substrate. CONSTITUTION:A magnetic memory part 3 is provided on the peripheral edge part of the surface of a glass substrate 1 covered with a mask pattern 2, and in the magnetic memory part 3, the size data of a mask pattern (a) and the defective data of a mask pattern (b) are stored. And at the time of transferring the pattern on the wafer by using the photomask, the defect of a transferred pattern due to the photomask is eliminated in advance by referring the data regarding the defect of the photomask already stored in the magnetic memory part 3 on the photomask substrate, then, the inspection of the wafer is performed. In this way, the efficiency and the reliability of the inspection of the wafer can be improved. |
