发明名称 SPUTTERING TARGET MATERIAL FOR FORMING PROTECTIVE LAYER OF THERMAL RECORDING HEAD
摘要 PURPOSE:To form a good quality protective layer, by constituting a sputtering target material for forming the protective layer of a thermal recording head of a ceramic sintered body having a composition wherein a specific amount of metal oxide for forming a glass phase is contained and the remainder is composed of specific beta'-sialon and inevitable impurities. CONSTITUTION:In forming the protective layer for a thermal recording head by sputtering, a ceramic sintered body having a composition containing beta'-sialon having a compositional formula as a hard phase forming component and 2-7 wt.% of one or more kind of metal oxide selected from oxides of Y, Mg, Sc and a rare earth metal as a glass phase forming component is used as a target material. The metal oxides in the ceramic sintered body allow the O/N ratio in the atmosphere at the time of sputtering to be well-balanced and the O/N ratio in the formed protective layer sufficiently satisfies the x-value in the compositional ratio of beta'-sialon being the hard phase forming component and, therefore, the protective layer has excellent oxidation resistance and abrasion resistance.
申请公布号 JPS6378760(A) 申请公布日期 1988.04.08
申请号 JP19860224299 申请日期 1986.09.22
申请人 MITSUBISHI METAL CORP 发明人 YASUJIMA TATSURO;YOSHIDA TAKESHI;MOCHIZUKI AKIRA
分类号 B41J2/335;H01L49/02 主分类号 B41J2/335
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