| 发明名称 |
PHOTOSENSITIVE POLYAMIC ACID DERIVATIVE, METHOD OF MANUFACTURING POLYIMIDE PATTERN ON A SUBSTRATE, AND SEMICONDUCTOR DEVICE COMPRISING A POLYIMIDE PATTERN OBTAINED BY USING THE SAID METHOD |
| 摘要 |
A photosensitive polyamic acid derivative, compounds used in the manufacture of the derivative, method of manufacturing a polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method. |
| 申请公布号 |
DE3469608(D1) |
申请公布日期 |
1988.04.07 |
| 申请号 |
DE19843469608 |
申请日期 |
1984.06.29 |
| 申请人 |
N.V. PHILIPS' GLOEILAMPENFABRIEKEN |
发明人 |
MINNEMA, LOURENS;VAN DER ZANDE, JOHAN MARIA |
| 分类号 |
G03F7/26;C08F290/00;C08F299/00;C08F299/02;C08G73/00;C08G73/10;G03C5/00;G03F7/037;G03F7/038;G03F7/40;(IPC1-7):G03F7/10;G03C1/68 |
主分类号 |
G03F7/26 |
| 代理机构 |
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