HEAT TREATMENT OF COMPOUND SEMICONDUCTOR DEVICE,申请号JP19860220897-传众专利搜索

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发明名称	HEAT TREATMENT OF COMPOUND SEMICONDUCTOR DEVICE
摘要
申请公布号	JPS6377124(A)	申请公布日期	1988.04.07
申请号	JP19860220897	申请日期	1986.09.20
申请人	FUJITSU LTD	发明人	ONISHI TOYOKAZU
分类号	H01L21/26;H01L21/265;H01L21/324	主分类号	H01L21/26
代理机构		代理人
主权项
地址

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