| 摘要 |
<p>PURPOSE:To obtain a manufacturing method for a picture element display device which facilitates the correction of connection parts of pictures by forming one substrate which has picture element electrodes and switching elements by performing an exposing process which uses two rotationally symmetric basic masks four times. CONSTITUTION:A basic mask F is printed at a position A, and then turned over and printed at a position B,and the basic mask F is further inverted horizontally and printed at a position C, and the turned over again and printed at a position D, thus performing exposure over the entire surface. In another way, the basic mask is printed at the position A, and then rotated by 180 deg. and printed at the position C, and the mask is inverted horizontally and printed at the position B and rotated again by 180 deg. lastly and printed at the position D, thus performing entire-surface exposure. Consequently, only one basic mask is used to form an image display device, so the irregularity and variance of an image are nearly eliminated and characteristics are easily maintained, so that only one expensive photomask is required for each level.</p> |
