| 摘要 |
PURPOSE:To detect the position of an alignment pattern by a method wherein the alignment pattern, which is arranged closely contacting between other patterns using the alignment pattern having specific periodicity, is distinguished from the patterns on the circumference after the configurational change of detected signal due to the change in focus position and the like has been tolerated. CONSTITUTION:The image information in two different directions is obtained from the image 1 containing the alignment pattern 2 provided on the objective substance such as a substrate and the like by an optical system and an image pickup means, the position of the alignment pattern 2 is detected from said image information, and the position of the objective substance is worked out from the result of said inspection. In the above-mentioned position detecting device for a substrate and the like, the alignment pattern 2 provided with a specific periodicity is used. As a result, the alignment pattern 2 can be distinguished from the other patterns 3 by selecting the modulated part, having the periodicity of the alignment pattern 2, from the waveforms 4 and 5 obtained by adding lengthwise and breadthwise the two dimensional image 1, and the alignment pattern 2 can be arranged adjoining to the circuit pattern and the like. |
