SEMICONDUCTOR EXPOSURE EQUIPMENT

摘要

PURPOSE:To enable contriving to make a detection system highly accurate and realizing a high-accuracy alignment by providing a variable position spatial filter which has an optical intensity balance detection system in the optical path of the detection system. CONSTITUTION:A mask 15, an optical imaging system 18 which forms the image of the pattern 16 written on the mask 15 on a wafer 19 and an exposure illumination system which irradiates exposure illumination light on the mask 15 are provided. In such a semiconductor exposure equipment, an alignment pattern illumination system which irradiates narrow spectrum width illumination light which irradiates a wafer alignment pattern 21 for alignment is provided and a detection system 1 which selectively extracts a desired spatial frequency region by providing a variable position spatial filter 9 which has an optical intensity balance detection system 25 in the spatial frequency region of the scattered light from the alignment pattern 21 and detects the image of the alignment pattern 21 on the wafer 19 illuminated by the alignment pattern illumination system via the optical imaging system 18 is provided.