发明名称 Photo-curable composition.
摘要 <p>A photo-curable composition having a high photosensitivity which comprises a photopolymerizable monomer and, as a photopolymerization initiatiation system, an aromatic ketone and an amine, characterized in that at least a portion of said monomer and/or said amine is an amine having an acryloyl or methacryloyl group in the molecule.</p>
申请公布号 EP0262242(A1) 申请公布日期 1988.04.06
申请号 EP19860113457 申请日期 1986.10.01
申请人 NIPPON PAINT CO., LTD. 发明人 SHIROTA, YASUHIKO;TAKIMOTO, YASUYUKI;KIMOTO, KOICHI;KAWABATA, MASAMI
分类号 C08F2/48;C08F2/50;G03F7/027;G03F7/031;(IPC1-7):C08F2/50;G03C1/68 主分类号 C08F2/48
代理机构 代理人
主权项
地址