发明名称 |
PHOTOMASK |
摘要 |
a main pattern of predetermined type fabricated on a quartz substrate; multiple subsidiary pattern where a slit is longer than the wavelength of a stepper source and is less than three times the wavelength on the assumption that the subsidiary pattern is fabricated as a predetermined type on where chrome is passivated among the region of the quartz substrate |
申请公布号 |
KR960000179(B1) |
申请公布日期 |
1996.01.03 |
申请号 |
KR19930010716 |
申请日期 |
1993.06.12 |
申请人 |
HYUNDAI ELECTRONICS IND. CO., LTD. |
发明人 |
BAE, SANG - MAN |
分类号 |
G03F1/36;G03F1/70;G03F7/20;H01L21/02;H01L21/027 |
主分类号 |
G03F1/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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