| 摘要 |
PURPOSE:To eliminate the need for a surface retouching layer and to obviate surface roughness, etc., by removing the peak parts of a dye layer formed in a resin layer on a photosensitive layer or transparent base selectively by dry etching and forming the color elements of color sepn. filters in the valley parts of the residual dye layer. CONSTITUTION:A mask pattern 2 and three dimensional dye layer 3 are formed on a substrate 1 and furthermore, the resin layer 4 is coated thereon. The dye layer 3 is eroded from the surface by dry etching and the etching is stopped to the extent at which the resin layer 4 slightly remains to dissolve away the unnecessary mask pattern 2 and the resin layer 4 and to obtain the dye layer 5. A mask pattern 6 and three-dimensional dye layer 7 are then formed on the color element 5 and furthermore, the resin layer 8 is coated thereon. The color element 9 of the 2nd color are formed when the mask pattern 6 is removed by dry etching. Finally, the residual resin layer 8 and the mask pattern 6 are dissolved away to obtain the color sepn. filter. The surface roughness, when generated in the drying etching stage, is dissolved away in the above-mentioned manner, by which the color sepn. filter having good transmittance is formed. |
