| 摘要 |
PURPOSE:To stably recognize a transparent conductive film pattern on a transparent substrate by executing the illumination from the rear surface of the transparent substrate and recognizing an image with the reflecting light of the illumination. CONSTITUTION:An indium tin oxide ITO film pattern 1 to recognize an image for alignment is formed on the surface of a transparent glass substrate 2, and a photoresist 3 having a sensitive hardenability to an ultraviolet exposure for the exposure in a photolithography is uniformly coated from the top of an ITO film. In the lower direction of the pattern 1, an aperture part 4a is provided for the image pick-up by a microscope camera 5. The camera 5 has a half mirror 6 between an objective lens 5a and an eyepiece 5b, and from other illumination light source 7 to the same axis as an observation light axis, the illumination of a visible light is given to an observing surface. Thus, a reflecting light from the observing surface is directly advanced, image-formed to an image pick-up element 8 and converted to an electric signal. |
