| 摘要 |
PURPOSE:To prevent a photographic sensitive material from generation of bacteria and molds by regulating the amt. of the water-washing liquid or stabilizing liquid to be supplied to a specified amt. and the amt. of Ca ion and Mg ion to below a specified amt. performing further washing with water and stabilizing processing in the presence of a specified hydroxy benzoic acid ester. CONSTITUTION:After developing an already exposed silver halide photographic sensitive material, it is processed in a stage for providing fixing effect followed by a water-washing stage or a stabilizing stage. Either of the concn. of Ca compd. and Mg compd. in the final tanks of the water-washing tank or the stabilizing tank is <=5mg/l, and the washing processing with water or the stabilizing processing is performed in the presence of a hydroxy benzoic acid ester expressed by the formula I. The amt. of the water-washing liquid and/or the stabilizing liquid to be supplied is (are) regulated to 2-50 times of the amt. brought from a preceding bath per unit area of the photosensitive material. By this method, the water-washing tank and the stabilizing tank are prevented from becoming turbid due to generation of bacteria or mold. |
