| 摘要 |
PROBLEM TO BE SOLVED: To diffuse boron uniformly with a high concentration and with the high reproducibility by a method wherein boron compound, alcoholic hydroxide base containing polymer compound, polyhydric alcohol and fluorine based surfactant are contained. SOLUTION: Boron is diffused in a semiconductor device by using both boron compound such as boric acid, boric anhydride, alkyl boric acid ester and boron chloride and alcoholic hydroxide base containing polymer compound which is obtained by mixing at least one or two among polyethylene oxide, polyhydroxy methylacrylate, polyhydroxy ethylacrylate, etc. Polyhydric alcohol and fluorine based surfactant are further contained in the boron compound obtained by using both of them to prepare solution. With this constitution, as the concentration of boron is high, boron can be diffused uniformly with a high concentration and with the high reproducibility and the roughed surface caused by the deposition of boric acid can be suppressed. |
