发明名称 ADJUSTING METHOD OF RESISTOR FOR HYBRID INTEGRATED CIRCUIT
摘要 PURPOSE:To obtain a stable adjusting method without aging, by emitting a laser beam under the state photoresist is applied to the surface, thereby adjusting the value of resistance, and removing the remaining dust at the cut part by immersing the device in etchant. CONSTITUTION:A conductor layer 3a is formed through a resistance film 3b for increasing adhearing force of a conductor material on an insulating substrate 5. Then, a photoresist film 6 is uniformly applied. Thereafter, a laser beam is projected, and a part of the conductor part is removed to the depth reaching the insulating substrate 5. Then a cut groove 3c is formed. The entire integrated circuit is immersed in etchant for the conductor and the resistor body. Then, the cut part without remaining dust is obtained as the cut part 3c. At this time, even overetching is performed, no change occurs in the resistor part. Therefore, the etching is performed for the sufficient time. Then the photoresist is removed.
申请公布号 JPS59189663(A) 申请公布日期 1984.10.27
申请号 JP19830064072 申请日期 1983.04.12
申请人 NIPPON DENKI KK 发明人 INOUE TADAHISA;OONO KENICHI
分类号 H01C17/22;H01C17/06;H01L27/01 主分类号 H01C17/22
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