| 摘要 |
PURPOSE:To decide easily whether positioning is correct or not at the time point of development by providing an alignment mark part having an alignment room to a ground pattern, and also a deciding mark part having an etching room, on a mask alignment key. CONSTITUTION:In a mask alignment key used for manufacturing a semiconductor device, the alignment key is formed by a ground mark 21 which makes an alignment mark part 21a large and makes an etching room deciding mark part 21b small, and a mark 22 which makes an alignment mark part 22a small and makes a deciding mark part 22b large. When alignment the mask, if a ground pattern 21' (broken line) on a wafer and a photoresist pattern 22' (full line hatching) have an alignment room in case of seeing the mark parts 21a, 22a, it is a correct alignment, and for instance, even if a resist pattern 22'' is shifted in the X direction against a ground pattern 21'' (broken line), if there is an etching room (b), it is within an allowable range. In this way, whether positioning is correct or not at the time point of development before etching can be decided by providing a deciding mark part. |
