| 摘要 |
<p>PURPOSE:To obtain a color filter having no defect at all by vapor-depositing selectively a color material to only a defective part of a color filter formed on a substrate. CONSTITUTION:A color filter 12 is formed directly on a substrate 13, and when a defect 11 exists, a positive resist film 21 is applied onto the substrate 13, and thereafter, it is prebaked. Subsequently, only one element portion (part of the defective part 11) of the color filter is exposed. After passing through a prescribed developing and rinsing process, a resist mask 31 in which a resist film does not exist on only the defective part is formed. As for this mask 31, the whole surface exposure is executed in advance in order to melt and remove it afterwards. Subsequently, a color material vapor-depositing film 41 is vapor- deposited, and the resist mask 31 is removed, by which a restored color filter 51 is obtained.</p> |
