| 摘要 |
PURPOSE:To irradiate the whole surface of a wafer uniformly with beams even under any processing conditions by mounting a plurality of annular light sources concentrically arranged centering around a straight line corresponding to a normal on the central position of a body to be irradiated supported by a support means. CONSTITUTION:A support means 6 supporting a body 5 to be irradiated and a plurality of annular light sources 1a-1c concentrically disposed centering around a straight line N corresponding to a normal on the central position of the body 5 to be irradiated supported by the support means 6 are provided. The body 5 to be irradiated such as a wafer 5 to be treated supported to a support means 6 such as a susceptor 6 is manufactured by quartz, etc., and positioned into a chamber 2 through which irradiation beams for heating are transmitted. A plurality of the annular light sources 1a-1c such as a plurality of annular light sources 1a-1c for heating fitted so as to hold the chamber in surfaces parallel with the upper and lower surfaces of the chamber 2 are arranged concentrically centering around the straight line N corresponding to the normal at the central position of the wafer 5 to be treated. A wafer extracting port 3 sealable on the side, a gas intake port 4 at an upper center, and a wafer temperature measuring system and a gas exhaust port 12 at a lower center are shaped respectively. |
