| 摘要 |
<p>A membrane (12) of the present invention used for a mask (10 -13) for X-ray exposure is made of an amorphous of boron nitride carbide hydrogenated, containing 1 to 10 atomic percent of carbon. This membrane (12) is made in a plasma CVD, whose source gases are ammonia, diborane and ethane diluted in argon gas. The flow rate ratio of the ammonia to the diborane is 0.6 to 1.55, the deposition temperature is 350 to 500 DEG C, the gas pressure is 60 to 250 Pa, an applied RF power is 0.1 to 0.17 W/cm<2>. Thus formed membrane (12) is adequately transparent to visible light and the X-ray used for mask alignment, while keeping the stiffness enough and the residual stress properly tensile.</p> |
