发明名称 ELECTROLESS PLATING BATH
摘要 PURPOSE:To prepare an electroless plating bath for forming a magnetic film having satisfactory magnetic characteristics by adding a specified amount of ions of Zn or the like to an electroless plating bath contg. Co ions, a reducing agent and a complexing agent and by using a water soluble hydroxycarboxylic acid as the complexing agent. CONSTITUTION:Metal ions of at least one among Zn, Ni, Mn and W are added to an electroless plating bath contg. Co ions, a reducing agent and complexing agent as essential components by 1-60mol% of the amount of the Co ions. The concn. of the Co ions is 0.02-1mol/l and the concn. of the metal ions is regulated to 0.001-0.5mol/l. A water soluble hydroxycarboxylic acid such as citric acid or tartaric acid or an aminocarboxylic acid such as glycine or DL-alpha-alanine is used as the complexing agent at about 0.05-2.5mol/l concn. A hypophosphite or the like is used as the reducing agent. Thus, an electroless plating bath for forming a magnetic film having satisfactory magnetic characteristics is stably obtd.
申请公布号 JPS6365084(A) 申请公布日期 1988.03.23
申请号 JP19860208599 申请日期 1986.09.04
申请人 MITSUBISHI CHEM IND LTD 发明人 KANEKO MAMORU;MATSUNAGA TOSHIKI
分类号 C23C18/34;C23C18/50;G11B5/858 主分类号 C23C18/34
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