| 摘要 |
A photoresist stripper composition comprises a mixture of (a) pyrrolidone, N-substituted pyrrolidones, butyrolactone or caprolactone as the major component and (b) from about 2 to about 10 percent by weight of a tetraalkylammonium hydroxide or a trialkylaralkylammonium hydroxide. Optional components of the mixture include surfactants, diluents and metal corrosion inhibitors. Extraneously added water is avoided. The compositions are efficient in stripping photoresists which, by reason of processing conditions, have become highly cross-linked and resistant to removal by solvents other than hot phenolic or halohydrocarbon strippers. |
