发明名称 |
Method and apparatus for laser-induced CVD |
摘要 |
A laser-induced CVD method in accordance with this invention comprises the steps of: setting a substrate in a reactive gas; applying a laser beam to the reactive gas to decompose it and produce not only free radicals but also ions due to multiphoton absorption; and applying an electric field thereby to efficiently transport the ions toward the substrate and deposit a thin film on the substrate at an increased deposition rate.
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申请公布号 |
US4732793(A) |
申请公布日期 |
1988.03.22 |
申请号 |
US19870010582 |
申请日期 |
1987.02.03 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
ITOH, HIROMI |
分类号 |
H01L21/31;C23C16/48;H01L21/205;H01L21/263;(IPC1-7):B05D3/06 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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