发明名称 Method and apparatus for laser-induced CVD
摘要 A laser-induced CVD method in accordance with this invention comprises the steps of: setting a substrate in a reactive gas; applying a laser beam to the reactive gas to decompose it and produce not only free radicals but also ions due to multiphoton absorption; and applying an electric field thereby to efficiently transport the ions toward the substrate and deposit a thin film on the substrate at an increased deposition rate.
申请公布号 US4732793(A) 申请公布日期 1988.03.22
申请号 US19870010582 申请日期 1987.02.03
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 ITOH, HIROMI
分类号 H01L21/31;C23C16/48;H01L21/205;H01L21/263;(IPC1-7):B05D3/06 主分类号 H01L21/31
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