| 摘要 |
PURPOSE:To prevent the contamination of the mask substrate and pellicle themselves by using a member consisting of only the material which does not sublimate and evaporate at and under an ordinary temp. and atmospheric pressure to constitute the pellicle. CONSTITUTION:A frame 3 of the pellicle 1 is formed of a metal such as aluminum or stainless steel and a transparent pellicle film 2 of nitrocellulose, etc., is provided on the frame 3. The frame 3 of the pellicle 1 is adhered to a substrate 5. The member consisting of the material which does not sublimate or evaporate at and under ordinary temp. and atmospheric pressure is used as the constituting member for the pellicle 1. For example, a stabilizer is not compounded with the nitrocellulose and tetra-kis {methylene(3,5-di-ti-butyl-4- hydroxyphenyl)propionate} methane, etc., are used. Since foreign matter is not generated from the pellicle during use, the contamination of the mask substrate and the decrease of the yield are prevented. |
