| 摘要 |
An electron microscope is provided in which in order to monitor operating waveforms within the element of a semiconductor integrated circuit, an electron beam is bombarded from an electron gun to the measuring point of a specimen to be measured, the resultant secondary electron emitted from the specimen to be measured is detected by a secondary electron detector in order to build up an image, and in which the specimen to be measured is stroboscopically scanned by controlling the electron gun with sampling pulses. A shield electrode is mounted nearest to the measuring point of the specimen to be measured such that the influences of the adjacent potentials different from that of the measuring point of the specimen to be measured, can be eliminated.
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