发明名称 Self-aligned bipolar fabrication process.
摘要 <p>Bipolar transistors are made by: forming a substitute emitter on a substrate; depositing polysilicon about the substitute emitter; removing the substitute emitter, and implanting the base through the resulting gap; forming dielectric spacers on the sidewalls of the opening; depositing polysilicon in the remains of the opening; and diffusing dopant from the polysilicon into the substrate to form a shallow emitter.</p>
申请公布号 EP0260059(A1) 申请公布日期 1988.03.16
申请号 EP19870307755 申请日期 1987.09.02
申请人 BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY 发明人 WELBOURN, ANTHONY DAVID;HESLOP, CHRISTOPHER JOHN HEDLEY
分类号 H01L21/033;H01L21/225;H01L21/331;H01L21/762 主分类号 H01L21/033
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