发明名称 |
Self-aligned bipolar fabrication process. |
摘要 |
<p>Bipolar transistors are made by: forming a substitute emitter on a substrate; depositing polysilicon about the substitute emitter; removing the substitute emitter, and implanting the base through the resulting gap; forming dielectric spacers on the sidewalls of the opening; depositing polysilicon in the remains of the opening; and diffusing dopant from the polysilicon into the substrate to form a shallow emitter.</p> |
申请公布号 |
EP0260059(A1) |
申请公布日期 |
1988.03.16 |
申请号 |
EP19870307755 |
申请日期 |
1987.09.02 |
申请人 |
BRITISH TELECOMMUNICATIONS PUBLIC LIMITED COMPANY |
发明人 |
WELBOURN, ANTHONY DAVID;HESLOP, CHRISTOPHER JOHN HEDLEY |
分类号 |
H01L21/033;H01L21/225;H01L21/331;H01L21/762 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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