发明名称 POSITIVE RADIATION SENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a positive radiation sensitive composition excellent in resolution and sensitivity. SOLUTION: The positive radiation sensitive composition contains (A) an amorphous compound containing a plurality of phenol groups protected by t-butoxycarbonyl groups in one molecule and having a molecular weight of <=3,000 and (B) diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as an acid generator which generates an acid under radiation.
申请公布号 JP2002328466(A) 申请公布日期 2002.11.15
申请号 JP20010134961 申请日期 2001.05.02
申请人 JSR CORP 发明人 UEDA MITSURU;SHIBAZAKI YUJI;FUJIGAYA TAKEHIKO
分类号 G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/004
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