发明名称 |
POSITIVE RADIATION SENSITIVE COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive radiation sensitive composition excellent in resolution and sensitivity. SOLUTION: The positive radiation sensitive composition contains (A) an amorphous compound containing a plurality of phenol groups protected by t-butoxycarbonyl groups in one molecule and having a molecular weight of <=3,000 and (B) diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate as an acid generator which generates an acid under radiation. |
申请公布号 |
JP2002328466(A) |
申请公布日期 |
2002.11.15 |
申请号 |
JP20010134961 |
申请日期 |
2001.05.02 |
申请人 |
JSR CORP |
发明人 |
UEDA MITSURU;SHIBAZAKI YUJI;FUJIGAYA TAKEHIKO |
分类号 |
G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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