| 摘要 |
PURPOSE:To improve accuracy by receiving the reflected beams of beams projected to the surface of a wafer by one-dimensional photodetector, making sure the position of the street of the surface of the wafer from a light receiving output from the photodetector and moving and controlling a stage so that the whole visual field of one-dimensional photodetector is kept within the inside of the street. CONSTITUTION:A light-receiving output from one-dimensional photodetector 3 is inputted to a control section 12, and the control section 12 recognizes a street formed to a wafer 4 on the basis of the light-receiving output from one dimensional photodetector 3, and moves and controls a theta-stage 5, an X-stage 6 and a Y-stage so that the whole visual field of one-dimensional photodetector 3 is kept within the inside of the street. The control section 12 shifts and controls the stages for alignment based on the recognition of the street regarding at least two positions of the stipulation of the street shaped to the wafer 4. Accordingly, the wafer to which a pattern is formed can be aligned precisely in a short time at a specified position. |
