METHOD FOR MEASURING LEVEL OF WAFER

摘要

PURPOSE: A method for measuring a level of a wafer is provided to prevent a processing error due to a shot region smaller than a level measuring region by preparing a variation of the shot region. CONSTITUTION: A wafer level measuring system is formed with a light emitting portion and a light receiving portion. The light emitting portion radiates measuring light to a measuring region(42) of a wafer(W) in order to measure a level of the wafer(W). The light receiving portion receives the light reflected from the measuring region(42). A size of the measuring region(42) is increased or reduced by varying a mutual position between the light emitting portion and the light receiving portion. The measuring region(42) is measured within the inside of a shot region(40). Namely, the size of the shot region(40) is larger than the size of the measuring region(42).