| 摘要 |
PURPOSE:To recover the system in a short time even if chemical and the like are mixed into a vacuum piping system, by providing a trap tank, which is used to prevent the mixing of the chemical from a base body, at the intermediate part of the vacuum piping system of an apparatus for treating a semiconductor substrate. CONSTITUTION:A trap tank 2 is provided between a base body 1 and a solenoid valve 3. A semiconductor substrate is sucked on the base body 1 with vacuum through the solenoid valve 3, the trap tank 2 and the base body 1 from a manifold 4. Even if chemical and the like are mixed from the base body 1 by any chance, they are stored in the trap tank 2. Therefore cleaning is performed up to this part. The system can be recovered with less man-hours and cost in a short time. |
