| 发明名称 |
Method and structure to segment RF coupling to silicon electrode |
| 摘要 |
An electrode assembly for use in a plasma processing system including a base electrode adapted to be coupled to a source of RF energy, a removable electrode removably coupled to the base electrode, and a material interposed between a surface of the base electrode and a surface of the removable electrode.
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| 申请公布号 |
US6806653(B2) |
申请公布日期 |
2004.10.19 |
| 申请号 |
US20030355203 |
申请日期 |
2003.01.31 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
STRANG ERIC J.;MITROVIC ANDREJ S. |
| 分类号 |
H01J37/32;(IPC1-7):H01J7/24;C23C14/00;C23C16/00 |
主分类号 |
H01J37/32 |
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