| 摘要 |
PURPOSE:To eliminate the shift between upper and lower magnetic poles and to form a magnetic pattern with high accurate core width by using a magnetic layer for the upper magnetic pole with a desired core width as an ion milling mask and etching a magnetic layer for the lower magnetic pole. CONSTITUTION:A resist pattern 9 becoming a mask for ion milling is formed inside the edge of the head tip side of an insulating layer 6. The tip parts of the magnetic layers 7a and 3a for the exposing upper and lower magnetic poles are worked by ion milling. At that time the magnetic layer 7a for the upper magnetic pole acts on the magnetic layer 3a for the lower magnetic pole as a mask. Ion milling is executed until the exposing tip of the magnetic layer 3a is completely removed and the film tu' of the magnetic layer 7a reaches a prescribed upper magnetic pole width tu. Afterwards,the resist pattern 9 is removed. In an obtained pattern on the tip of the magnetic pole, the upper magnetic pole 7 (film thickness tu) and the lower magnetic pole 3 (film thickness tD) are matched in terms of position. |
