发明名称 CONTROL METHOD OF RETICLE MASKING BLADE SYSTEM AND RETICLE MASKING BLADE, AND LEVITATION DEVICE OF RETICLE MASKING BLADE
摘要 PROBLEM TO BE SOLVED: To provide a REMA-blade stage mechanism supporting guided motion of a REMA blade in high-vacuum environment, in addition, supporting several degrees of freedom of the motion. SOLUTION: The mechanism has a REMA blade system including a REMA blade, a REMA-blade carriage assembly, a set of electromagnetic-force actuators, an electromagnetic linear motor, a sensor set, and a servo mechanism. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004363606(A) 申请公布日期 2004.12.24
申请号 JP20040164967 申请日期 2004.06.02
申请人 ASML HOLDING NV 发明人 CARTER FREDERICK M;GALBURT DANIEL N;ROUX STEPHEN
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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