| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing apparatus for speedily and cleanly washing not only the surface of a work but also the edge of the work by simple constitution. SOLUTION: The substrate washing apparatus 10 washes a substrate by holding and rotating the substrate W and supplying washing liquid imparted with ultrasonic vibration from a nozzle 30 to the substrate. The apparatus is provided with a nozzle moving means 14 for supporting the nozzle 30 and moving it along the surface of the substrate W and the edge of the substrate, and an inclination adjusting means 16 which is equipped at the moving means 14 in an angle-adjustable manner to keep the inclination of the nozzle with respect to the axis of the nozzle 30, the surface of the substrate W and the edge of the substrate W to be constant. COPYRIGHT: (C)2005,JPO&NCIPI
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