| 发明名称 |
METHOD FOR FORMING PATTERN, METHOD FOR FORMING INTERCONNECTION PATTERN, ELECTRICAL OPTICAL DEVICE AND ELECTRONIC INSTRUMENT TO EVAPORATE OR ANALYZE THIN FILM OF DESIRED REGION AND PATTERN THIN FILM |
| 摘要 |
PURPOSE: A method for forming a pattern is provided to evaporate or analyze a thin film of a desired region and pattern a thin film by installing a sublimation material on or in a base member. CONSTITUTION: A thin film(2) is formed on a base member(1) including a sublimation material. Light is irradiated to the base member. The sublimation material in a desired region is sublimed by the heat generated by the irradiation of the light. The thin film corresponding to the irradiation region is eliminated to pattern the thin film. |
| 申请公布号 |
KR20050017591(A) |
申请公布日期 |
2005.02.22 |
| 申请号 |
KR20040063269 |
申请日期 |
2004.08.11 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
TOYODA, NAOYUKI |
| 分类号 |
G03F7/004;B05D3/06;B05D3/12;B41M5/24;B41M5/46;G02B5/20;G02F1/1335;G02F1/1343;G03C8/00;G03F7/00;G03F7/36;H01L21/20;H01L51/00;H01L51/50;H05B33/10;H05B33/14;H05B33/26;H05K3/06;H05K3/14;(IPC1-7):H01L21/20 |
主分类号 |
G03F7/004 |
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